IC lead thav duab yog lub tshuab luam ntawv hluav taws xob tsim hluav taws xob uas txuas cov xov hlau thiab cov khoom siv hluav taws xob los ntawm cov hlau lead.Cov thev naus laus zis no tau siv dav hauv kev tsim cov khoom siv hluav taws xob sib xyaw (IC) thiab luam tawm Circuit Board hauv cov khoom siv hluav taws xob.Tsab ntawv xov xwm no yuav qhia txog daim ntawv thov thiab qhov zoo ntawm IC txhuas thav ntawv, thiab tshawb nrhiav daim ntawv thov thiab kev siv photolithography hauv IC lead thav duab tsim thiab cov ntaub ntawv siv.
Ua ntej, IC txhuas ncej yog cov cuab yeej siv tau zoo uas tuaj yeem txhim kho kev ruaj ntseg thiab kev ntseeg siab ntawm cov khoom siv hluav taws xob.Hauv kev tsim IC, cov hlau lead yog ib txoj hauv kev txhim khu kev qha hluav taws xob sib txuas uas ua kom cov khoom siv hluav taws xob ntawm lub rooj tsav xwm Circuit Court raug txuas nrog lub ntsiab nti.Tsis tas li ntawd, IC lead thav duab tuaj yeem txhim kho kev ntseeg tau ntawm cov rooj sib tham hauv Circuit Court vim tias lawv tuaj yeem ua rau cov rooj tsav xwm hauv Circuit Court muaj zog dua txhua yam thiab zoo dua corrosion kuj.
Thib ob, photolithography yog cov cuab yeej siv feem ntau rau kev tsim IC txhuas thav ntawv.Cov thev naus laus zis no yog ua raws li cov txheej txheem photolithography, uas tsim cov hlau lead thav duab los ntawm kev nthuav tawm cov yeeb yaj kiab hlau rau lub teeb thiab tom qab ntawd etching nrog cov tshuaj tov tshuaj.Photolithography tshuab muaj qhov zoo ntawm kev ua haujlwm siab, kev ua haujlwm siab, thiab tus nqi qis, yog li nws tau siv dav hauv IC txhuas thav duab tsim.
Hauv IC lead thav duab raug tsim, cov khoom siv tseem ceeb siv yog hlau nyias zaj duab xis.Cov hlau nyias zaj duab xis tuaj yeem yog tooj liab, txhuas, lossis kub, thiab lwm yam ntaub ntawv.Cov hlau nyias zaj duab xis feem ntau yog npaj los ntawm lub cev vapor deposition (PVD) los yog tshuaj vapor deposition (CVD) cov tswv yim.Nyob rau hauv IC txhuas thav duab raug tsim, cov hlau nyias zaj duab xis yog coated rau ntawm lub rooj tsavxwm Circuit Court thiab ces precisely etched los ntawm photolithography technology los tsim zoo txhuas thav ntawv.
Nyob rau hauv xaus, IC lead ncej technology plays lub luag hauj lwm tseem ceeb nyob rau hauv niaj hnub electronics.Los ntawm kev siv tshuab photolithography thiab hlau nyias zaj duab xis cov ntaub ntawv, siab precision, high efficiency, thiab tsawg-nqi txhuas thav duab tuaj yeem tsim.Qhov zoo ntawm cov thev naus laus zis no yog tias nws tuaj yeem txhim kho kev ntseeg tau thiab ruaj khov ntawm cov khoom siv hluav taws xob, yog li ua rau kev txhim kho ntawm cov cuab yeej hluav taws xob niaj hnub no.
Post lub sij hawm: Feb-28-2023
